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High-κ gate dielectrics: Current status and materials properties considerations

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High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk; Robert M. Wallace; J. Anthony · Journal of Applied Physics · 2001

Many materials systems are currently under consideration as potential replacements for SiO2 as the gate dielectric material for sub-0.1 μm complementary metal–oxide–semiconductor (CMOS) technology. A systematic cons...

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IET Computers & Digital Techniques

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IET Computers & Digital Techniques

Wiley; United Kingdom · ISSN 1751-8601

Subjects / keywords: cmos technology, computer hardware, computer software, hardware trust and security, many-core systems, digital system design; Technology: Electrical engineering. Electronics. Nuclear engineering: Electronics: Computer en...

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