Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability
Prawal P.K. Agarwal et al · KeAi Communications Co. Ltd · 2026
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APA 7
al, P. P. A. E. (2026). Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability. https://doi.org/10.1016/j.fpc.2025.11.011
MLA
al, Prawal P.K. Agarwal et. "Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability." 2026. https://doi.org/10.1016/j.fpc.2025.11.011.
Chicago
al, Prawal P.K. Agarwal et. 2026. "Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability.". https://doi.org/10.1016/j.fpc.2025.11.011.
Harvard
al, P. P. A. E. 2026, Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability, KeAi Communications Co. Ltd, available at: https://doi.org/10.1016/j.fpc.2025.11.011 [Accessed 6 Aug. 2026].
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- Titolo
- Plasma-enhanced chemical vapor deposited films on aluminum nanoparticles for enhanced oxidative heat release, extended shelf life, and better dispersion stability
- Autore / collaboratori
- Prawal P.K. Agarwal et al
- Editore
- KeAi Communications Co. Ltd
- Anno di pubblicazione
- 2026
- ISSN
- 2667-1344
- ISSN
- 2667-1344
- Lingua
- Inglés
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