Torna ai risultati
Scheda bibliografica · Consultazione e accesso
Artículo

Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates

Xiongwei Guo et al · KeAi Communications Co., Ltd · 2024

Accesso aperto disponibile
Lettura rapida. Controlla i dati essenziali della risorsa e accedi al contenuto con il pulsante principale. La scheda mostra solo le informazioni necessarie per identificare, citare e aprire l’opera.

Accesso alla risorsa

Apri il contenuto dall’opzione principale o scegli un’altra fonte disponibile.

DOAJ DOAJ Articles
Entrar por DOAJ
Accesso principale

Accesso aperto disponibile

Recurso identificado como acceso abierto, sin confirmar automáticamente si es texto completo directo.
Apri risorsa

Riepilogo

Descripción general del contenido del recurso.

Abstract It is difficult to effectively improve the low bonding strength of TA1/304 clad plates. This study proposes a new process for applying pulse current (1500 A, 500 Hz, 50% duty cycle) to TA1/304 clad plates during the rolling process, which changes the interface microstructure and effectively improves the bonding strength of the clad plates. The influence of the pulsed current on the interface microstructure and bonding strength was systematically studied. The results indicate that the clad plate is initially bonded at 750 °C and 35% reduction ratio under electrically-assisted rolling (EAR), and finally the higher bonding strength is obtained at 850 °C and 48% reduction ratio, reaching 395 MPa. The strengthening of the interface element diffusion and grain refinement under the action of the pulsed current are important reasons for the improvement in the bonding strength of the clad plate. This discovery provides new ideas for the preparation of clad plates with high bonding performance.

Come citare

Elegí el formato que necesitás y copiá la referencia al portapapeles.

APA 7

al, X. G. E. (2024). Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates. https://doi.org/10.1186/s10033-024-01097-3

MLA

al, Xiongwei Guo et. "Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates." 2024. https://doi.org/10.1186/s10033-024-01097-3.

Chicago

al, Xiongwei Guo et. 2024. "Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates.". https://doi.org/10.1186/s10033-024-01097-3.

Harvard

al, X. G. E. 2024, Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates, KeAi Communications Co, Ltd, available at: https://doi.org/10.1186/s10033-024-01097-3 [Accessed 8 Aug. 2026].

Condividi e stampa

Salva la scheda, copia il link permanente o stampala in PDF.

Esporta riferimento

Esporta il record nei formati più comuni per usarlo con un gestore bibliografico.

Dettagli della risorsa

Informazioni bibliografiche utili per verificare che sia il materiale corretto.

Titolo
Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates
Autore / collaboratori
Xiongwei Guo et al
Editore
KeAi Communications Co., Ltd
Anno di pubblicazione
2024
ISSN
2192-8258
ISSN
2192-8258
Lingua
Inglés

Soggetti

Esplora risorse correlate a partire da questi soggetti.

Copiato