Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning
Jenkins Ronald P. et al · Wiley · 2021
3-D near-field imaging of guided modes in nanophotonic waveguides
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APA 7
al, J. R. P. E. (2021). Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning. https://doi.org/10.1515/nanoph-2021-0428
MLA
al, Jenkins Ronald P. et. "Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning." 2021. https://doi.org/10.1515/nanoph-2021-0428.
Chicago
al, Jenkins Ronald P. et. 2021. "Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning.". https://doi.org/10.1515/nanoph-2021-0428.
Harvard
al, J. R. P. E. 2021, Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning, Wiley, available at: https://doi.org/10.1515/nanoph-2021-0428 [Accessed 9 Aug. 2026].
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- Titolo
- Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning
- Autore / collaboratori
- Jenkins Ronald P. et al
- Editore
- Wiley
- Anno di pubblicazione
- 2021
- ISSN
- 2192-8614
- ISSN
- 2192-8614
- Lingua
- Inglés
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