Torna ai risultati
Scheda bibliografica · Consultazione e accesso
Artículo

Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization

Chen Yuheng et al · Wiley · 2025

Materiale supplementare disponibile
Lettura rapida. Controlla i dati essenziali della risorsa e accedi al contenuto con il pulsante principale. La scheda mostra solo le informazioni necessarie per identificare, citare e aprire l’opera.
Pubblicazione seriale

3-D near-field imaging of guided modes in nanophotonic waveguides

Questa pubblicazione seriale contiene 146 contenuti correlati.

Accesso alla risorsa

Apri il contenuto dall’opzione principale o scegli un’altra fonte disponibile.

DOAJ DOAJ Articles
Entrar por DOAJ
Accesso principale

Materiale supplementare disponibile

El enlace apunta a material asociado, anexos, tablas, datos o página complementaria. No se marca como libro/texto completo.
Apri materiale

Riepilogo

Descripción general del contenido del recurso.

Photonic device development (PDD) has achieved remarkable success in designing and implementing new devices for controlling light across various wavelengths, scales, and applications, including telecommunications, imaging, sensing, and quantum information processing. PDD is an iterative, five-step process that consists of: (i) deriving device behavior from design parameters, (ii) simulating device performance, (iii) finding the optimal candidate designs from simulations, (iv) fabricating the optimal device, and (v) measuring device performance. Classically, all these steps involve Bayesian optimization, material science, control theory, and direct physics-driven numerical methods. However, many of these techniques are computationally intractable, monetarily costly, or difficult to implement at scale. In addition, PDD suffers from large optimization landscapes, uncertainties in structural or optical characterization, and difficulties in implementing robust fabrication processes. However, the advent of machine learning over the past decade has provided novel, data-driven strategies for tackling these challenges, including surrogate estimators for speeding up computations, generative modeling for noisy measurement modeling and data augmentation, reinforcement learning for fabrication, and active learning for experimental physical discovery. In this review, we present a comprehensive perspective on these methods to enable machine-learning-assisted PDD (ML-PDD) for efficient design optimization with powerful generative models, fast simulation and characterization modeling under noisy measurements, and reinforcement learning for fabrication. This review will provide researchers from diverse backgrounds with valuable insights into this emerging topic, fostering interdisciplinary efforts to accelerate the development of complex photonic devices and systems.

Come citare

Elegí el formato que necesitás y copiá la referencia al portapapeles.

APA 7

al, C. Y. E. (2025). Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization. https://doi.org/10.1515/nanoph-2025-0049

MLA

al, Chen Yuheng et. "Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization." 2025. https://doi.org/10.1515/nanoph-2025-0049.

Chicago

al, Chen Yuheng et. 2025. "Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization.". https://doi.org/10.1515/nanoph-2025-0049.

Harvard

al, C. Y. E. 2025, Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization, Wiley, available at: https://doi.org/10.1515/nanoph-2025-0049 [Accessed 7 Aug. 2026].

Condividi e stampa

Salva la scheda, copia il link permanente o stampala in PDF.

Esporta riferimento

Esporta il record nei formati più comuni per usarlo con un gestore bibliografico.

Dettagli della risorsa

Informazioni bibliografiche utili per verificare che sia il materiale corretto.

Titolo
Machine-learning-assisted photonic device development: a multiscale approach from theory to characterization
Autore / collaboratori
Chen Yuheng et al
Editore
Wiley
Anno di pubblicazione
2025
ISSN
2192-8614
ISSN
2192-8614
Lingua
Inglés

Soggetti

Esplora risorse correlate a partire da questi soggetti.

Copiato