Influence of structure on the magnetoresistive properties of discontinuous multilayer structures based on Ni80Fe20 and SiO

This work presents the results of experimental studies on the structure and magnetoresistive properties of [Ni80Fe20(dNi80Fe20)/SiO(5)]5/S discontinuous multilayer structures. It is shown that for both as-deposited and annealed structures at temperatures of 400, 500, 600, and 700 K with an effective thickness of Ni80Fe20 layer dNi80Fe20 = 6-8 nm, anisotropic magnetoresistance is observed. It was found that annealing at 500 K for samples with dNi80Fe20 = 4-5 nm leads to the emergence of isotropic magnetoresistance due to insulating interlayers forming between magnetic granules. After annealing at 600 K, anisotropic magnetoresistance reappears in structures with dNi80Fe20 > 4 nm due to the breakdown of the structural continuity of the insulating layers.