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Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure

Zimu Li et al · Cambridge University Press · 2026

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This study reports a new optically addressed spatial light modulator (OASLM) structure based on bilateral-sapphire substrates with an air gap that exhibits high-average-power laser resistance. The resistance of traditional OASLMs to high-average-power laser irradiation is primarily affected by the high absorption of the transparent conductive film and low thermal conductivity of the substrate. Thermodynamic simulations indicated that the thermal conductivity of a sapphire substrate was significantly higher than that of K9 glass. Using sapphire as the substrate significantly reduced the temperature increase of indium tin oxide. An OASLM based on this structure, without any auxiliary cooling measures, exhibited a higher high-average-power laser resistance (170 W/cm2) than that of a K9 glass OASLM (9 W/cm2).

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APA 7

al, Z. L. E. (2026). Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure. https://doi.org/10.1017/hpl.2026.10110

MLA

al, Zimu Li et. "Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure." 2026. https://doi.org/10.1017/hpl.2026.10110.

Chicago

al, Zimu Li et. 2026. "Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure.". https://doi.org/10.1017/hpl.2026.10110.

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al, Z. L. E. 2026, Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure, Cambridge University Press, available at: https://doi.org/10.1017/hpl.2026.10110 [Accessed 10 Aug. 2026].

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Title
Improvement in high-average-power laser resistance of an optically addressed spatial light modulator based on a new air-gap structure
Author / contributors
Zimu Li et al
Publisher
Cambridge University Press
Publication year
2026
ISSN
2095-4719
ISSN
2095-4719
Language
English

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