Atomically Thin <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:msub> <mml:mi>MoS</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> : A New Direct-Gap Semiconductor
Kin Fai Mak; Changgu Lee; James Hone; Jie Shan; Tony F. Heinz · Physical Review Letters · 2010
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APA 7
Mak, K. F, Lee, C, Hone, J, Shan, J, & Heinz, T. F. (2010). Atomically Thin MoS 2: A New Direct-Gap Semiconductor. https://doi.org/10.1103/physrevlett.105.136805
MLA
Mak, Kin Fai, et al. "Atomically Thin MoS 2: A New Direct-Gap Semiconductor." 2010. https://doi.org/10.1103/physrevlett.105.136805.
Chicago
Mak, Kin Fai, Changgu Lee, James Hone, Jie Shan, and Tony F. Heinz. 2010. "Atomically Thin MoS 2: A New Direct-Gap Semiconductor.". https://doi.org/10.1103/physrevlett.105.136805.
Harvard
Mak, K. F. et al. 2010, Atomically Thin MoS 2: A New Direct-Gap Semiconductor, Physical Review Letters, available at: https://doi.org/10.1103/physrevlett.105.136805 [Accessed 10 Aug. 2026].
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- Title
- Atomically Thin <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:msub> <mml:mi>MoS</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> : A New Direct-Gap Semiconductor
- Author / contributors
- Kin Fai Mak; Changgu Lee; James Hone; Jie Shan; Tony F. Heinz
- Publisher
- Physical Review Letters
- Publication year
- 2010
- Language
- lv
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