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Etching-assisted femtosecond laser modification of hard materials

Liu Xue-Qing et al · Editorial Office of Opto-Electronic Journals Group, Institute of Optics and Electronics, CAS, China · 2019

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With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching-assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.

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APA 7

al, L. X. Q. E. (2019). Etching-assisted femtosecond laser modification of hard materials. https://doi.org/10.29026/oea.2019.190021

MLA

al, Liu Xue-Qing et. "Etching-assisted femtosecond laser modification of hard materials." 2019. https://doi.org/10.29026/oea.2019.190021.

Chicago

al, Liu Xue-Qing et. 2019. "Etching-assisted femtosecond laser modification of hard materials.". https://doi.org/10.29026/oea.2019.190021.

Harvard

al, L. X. Q. E. 2019, Etching-assisted femtosecond laser modification of hard materials, Editorial Office of Opto-Electronic Journals Group, Institute of Optics and Electronics, CAS, China, available at: https://doi.org/10.29026/oea.2019.190021 [Accessed 6 Aug. 2026].

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Title
Etching-assisted femtosecond laser modification of hard materials
Author / contributors
Liu Xue-Qing et al
Publisher
Editorial Office of Opto-Electronic Journals Group, Institute of Optics and Electronics, CAS, China
Publication year
2019
ISSN
2096-4579
ISSN
2096-4579
Language
English

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