Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates
Xiongwei Guo et al · KeAi Communications Co., Ltd · 2024
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APA 7
al, X. G. E. (2024). Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates. https://doi.org/10.1186/s10033-024-01097-3
MLA
al, Xiongwei Guo et. "Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates." 2024. https://doi.org/10.1186/s10033-024-01097-3.
Chicago
al, Xiongwei Guo et. 2024. "Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates.". https://doi.org/10.1186/s10033-024-01097-3.
Harvard
al, X. G. E. 2024, Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates, KeAi Communications Co, Ltd, available at: https://doi.org/10.1186/s10033-024-01097-3 [Accessed 8 Aug. 2026].
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- Title
- Effect of Pulse Current on Interface Microstructure and Bonding Properties of TA1/304 Double-Layer Clad plates
- Author / contributors
- Xiongwei Guo et al
- Publisher
- KeAi Communications Co., Ltd
- Publication year
- 2024
- ISSN
- 2192-8258
- ISSN
- 2192-8258
- Language
- English
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