Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
Kenji Nomura; Hiromichi Ohta; Akihiro Takagi; Toshio Kamiya; Masahiro Hirano; Hideo Hosono · Nature · 2004
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APA 7
Nomura, K, Ohta, H, Takagi, A, Kamiya, T, Hirano, M, & Hosono, H. (2004). Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors. https://doi.org/10.1038/nature03090
MLA
Nomura, Kenji, et al. "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors." 2004. https://doi.org/10.1038/nature03090.
Chicago
Nomura, Kenji, Hiromichi Ohta, Akihiro Takagi, Toshio Kamiya, Masahiro Hirano, and Hideo Hosono. 2004. "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors.". https://doi.org/10.1038/nature03090.
Harvard
Nomura, K. et al. 2004, Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors, Nature, available at: https://doi.org/10.1038/nature03090 [Accessed 10 Aug. 2026].
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- Title
- Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
- Author / contributors
- Kenji Nomura; Hiromichi Ohta; Akihiro Takagi; Toshio Kamiya; Masahiro Hirano; Hideo Hosono
- Publisher
- Nature
- Publication year
- 2004
- Language
- English
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