Peculiarities of Forming of Microwave Arsenide-Gallium Submicron Structures of Large-scale Integrated Circuit

<p>The peculiarities of technological processes of formation of submicron Schottky field transistors usingarsenide-gallium technology, i.e. the technology of Schottky field transistors formation with a self-alifned gate onthe basis of nitride or silicide of tungsten, are considered in the paper. A highly effective technology for theformation of capsular layers of AlN and BN nitride films by high-frequency magnetron sputtering of the propertarget in nitric plasma for the realization of GaAs-based MOS-transistors is developed.</p><p><strong>Keywords</strong>: gallium arsenide, Schottky field transistors, tungsten nitride, tungsten silicide, monocrystallinesilicon.</p>