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Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2

Zhang Songtian S. et al · Wiley · 2023

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Among the family of transition metal dichalcogenides, 1T-TaS2 stands out for several peculiar physical properties including a rich charge density wave phase diagram, quantum spin liquid candidacy and low temperature Mott insulator phase. As 1T-TaS2 is thinned down to the few-layer limit, interesting physics emerges in this quasi 2D material. Here, using scanning near-field optical microscopy, we perform a spatial- and temperature-dependent study on the phase transitions of a few-layer thick microcrystal of 1T-TaS2. We investigate encapsulated air-sensitive 1T-TaS2 prepared under inert conditions down to cryogenic temperatures. We find an abrupt metal-to-insulator transition in this few-layer limit. Our results provide new insight in contrast to previous transport studies on thin 1T-TaS2 where the resistivity jump became undetectable, and to spatially resolved studies on non-encapsulated samples which found a gradual, spatially inhomogeneous transition. A statistical analysis suggests bimodal high and low temperature phases, and that the characteristic phase transition hysteresis is preserved down to a few-layer limit.

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APA 7

al, Z. S. S. E. (2023). Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2. https://doi.org/10.1515/nanoph-2022-0750

MLA

al, Zhang Songtian S. et. "Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2." 2023. https://doi.org/10.1515/nanoph-2022-0750.

Chicago

al, Zhang Songtian S. et. 2023. "Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2.". https://doi.org/10.1515/nanoph-2022-0750.

Harvard

al, Z. S. S. E. 2023, Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2, Wiley, available at: https://doi.org/10.1515/nanoph-2022-0750 [Accessed 10 Aug. 2026].

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Title
Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2
Author / contributors
Zhang Songtian S. et al
Publisher
Wiley
Publication year
2023
ISSN
2192-8606
ISSN
2192-8606
Language
English

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